Qhov cuam tshuam ntawm kev sib xyaw ntawm Electroplating tsis nyob rau ntawm Deposition ceev ntawm hluav taws xob cua sov raj

Qhov cuam tshuam ntawm kev sib xyaw ntawm Electroplating tsis nyob rau ntawm Deposition ceev ntawm hluav taws xob cua sov raj

Cov nyhuv ntawm buffer concentration ntawm sedimentation tus nqi

Lub complexity ntawm kev hloov nyob rau hauv muaj pes tsawg leeg ntawm lub hauv paus alloy plating tov thiab plating txheej txheem tsis muaj feem xyuam rau cov deposition tus nqi vim muaj ntau yam. Yog li ntawd, nws yog ib qho tsim nyog yuav tsum ua qhov kev tshawb fawb tob txog tus nqi ntawm cov tshuaj chemical deposition. Qhov cuam tshuam nkhaus ntawm qhov loj ntawm qhov tsis sib xws (NH, CI) ntawm tus nqi tso nyiaj. Ntxiv chloride ua ib qho tsis rau hauv cov tshuaj plating tuaj yeem tswj cov pH ntawm cov tshuaj plating nyob rau hauv qhov qub.

Thaum cov concentration ntawm chlorination yog tsawg, lub peev xwm buffering tsis muaj zog thiab cov deposition npaum li cas sai dua; Raws li qhov loj concentration ntawm qhov tsis tuaj yeem nce, cov tshuaj lom neeg ultrasonic tso tawm maj mam txo. Qhov ceev ntawm ultrasonic dawb tshuaj deposition yog me ntsis cuam tshuam los ntawm kev hloov ntawm tsis.

3 Kev xaus

1) Nyob rau hauv ultrasonic tej yam kev mob, cov tshuaj deposition tus nqi ntawm Co Ni B-Ce nce mus txog 300o. Txawm li cas los xij, raws li lub suab siv zog nce ntxiv, kev ruaj ntseg ntawm cov tshuaj tso tawm cov tshuaj txo qis, ua rau nws tus kheej decomposition thiab txo qis hauv cov deposition sai.

2) Nyob rau hauv ib tug tej yam ntau yam, cov tshuaj ultrasonic deposition tus nqi nce nrog qhov nce ntawm kub, lub ntsiab ntsev concentration, thiab txo tus neeg sawv cev concentration; Kev kho kom haum xeeb ntawm ultrasound ua rau muaj kev cuam tshuam ntawm ntau yam ntawm cov txheej txheem plating ntawm qhov tso nyiaj kom pom tseeb heev.

3) Los ntawm kev txheeb xyuas cov txheej txheem, cov txheej txheem zoo tshaj plaws rau kev tso tawm tshuaj ultrasonic tau txais: COC12 · 6H2011.7g / L; NiC12·6H205-0g/L; NaBH, 0.7g/L; Na2C4H406·2H2065.0g/L; NH, Cl14.0g/L; 060c; ua. PH 13-14; Ultrasonic zaus 40kHz; Lub suab siv 0.15W / cm'o

. Rau cov tshuaj tiv thaiv kab mob, muaj qhov zoo tshaj plaws lub suab siv tus nqi uas tuaj yeem ua tiav qhov siab tshaj plaws cov tshuaj tiv thaiv. Hauv qhov kev sim, raws li lub suab siv zog nce, cov tshuaj plating ua rau nws tus kheej decomposition, yog li txo tus nqi deposition.

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