Nqus electroplating hluav taws xob cua sov raj quadrupole sputtering

Nqus electroplating hluav taws xob cua sov raj quadrupole sputtering

Nyob rau hauv lub hauv paus ntawm peb-ncej sputtering, ib tug buncher kauj, tseem hu ua auxiliary anode los yog stabilization electrode, yog txuas sab nraum lub txheej chamber. Lub luag haujlwm ntawm cov bunching coil yog sib sau ua ke electrons ntawm lub hom phiaj cathode thiab substrate anode, thaum lub sij hawm uas tsis tshua muaj hluav taws xob, high-tam sim no plasma arc kem yog tsim, ib tug loj tus naj npawb ntawm electrons sib tsoo nrog cov roj rau ionization, thiab ib tug loj. Tus naj npawb ntawm ions raug tsim. Cov electrons ua ib qho kev sib tw, uas ua rau qhov kev ncua deb ntawm cov electrons mus rau lub electron collector, yog li ua rau qhov tshwm sim ntawm kev sib tsoo ionization, thiab qhov ceev tam sim no nce mus txog 2-5mA / cm2. Tsis tas li ntawd, lub condenser coil kuj muaj kev ua haujlwm ruaj khov ntawm qhov tso tawm.

Txoj kev sputtering no tseem tsis tuaj yeem cuam tshuam lub foob pob ntawm lub substrate los ntawm high-speed electrons generated los ntawm lub hom phiaj, thiab kuj muaj teeb meem xws li paug ntawm zaj duab xis vim impurities nyob rau hauv lub filament.

Nqus electroplating hluav taws xob cua sov raj peb-ncej sputtering

Peb-ncej sputtering yog txuas ib lub electrode, ib tug kub cathode, mus rau lub ntaus ntawv ntawm ob-ncej sputtering, uas emits thermionic electrons. Nws tuaj yeem tsis tsuas yog txhim kho tus nqi sputtering, tab sis kuj ua rau kev tswj ntawm sputtering tej yam kev mob yooj yim dua. Qhov ceev tam sim no tau nce mus rau 1-3mA/cm2, thiab lub hom phiaj voltage txo mus rau 1-2kv. Kub cathode 0-50v tsis zoo bias. Nyob rau hauv txoj kev no, tus nqi sputtering yog nce thiab qhov zoo ntawm cov txheej yog txhim kho vim muaj zog deposition nqus tsev vacuum.

Disadvantages ntawm Diode Sputtering rau Nqus Electroplating Hluav Taws Kub Kub Tubes

Diode sputtering yog ib qho ntawm cov txheej txheem sputtering ntxov tshaj plaws. Nws siv cov khoom siv txheej txheej raws li cathode thiab cov khoom siv coated li anode. Lub cathode txuas nrog DC tsis zoo siab voltage ntawm 1-3KV, thiab cov anode feem ntau yog hauv av. Thaum ua haujlwm, thawj lub tshuab nqus tsev, thiab tom qab ntawd dhau cov roj argon ua kom lub tshuab nqus tsev mus txog qhov siab ntawm sputtering. Thaum lub hwj chim qhib, qhov tsis zoo ntawm qhov hluav taws xob siab ntawm lub hom phiaj cathode ua rau lub ntsej muag ci ntawm ob tug ncej thiab tsim kom muaj ib cheeb tsam plasma, nyob rau hauv qhov zoo argon ions tau nrawm kom tawg lub hom phiaj cathode nyob rau hauv qhov kev txiav txim ntawm lub peev xwm cathode. poob ze ntawm lub cathode, thiaj li hais tias qhov chaw ntawm lub hom phiaj cov khoom yog ceev. Nws yog sputtered thiab tso rau ntawm qhov chaw ntawm lub substrate nyob rau hauv lub molecular los yog atomic lub xeev los tsim ib tug nyias zaj duab xis ntawm lub hom phiaj cov khoom.

Qhov zoo tshaj plaws ntawm cov cuab yeej no yog nws cov qauv yooj yim thiab tswj tau yooj yim. Qhov tsis zoo yog: zaj duab xis yog smeared vim muaj kev ua haujlwm siab; tus nqi deposition tsawg, thiab cov yeeb yaj kiab tuab saum 10um tsis tuaj yeem plated; Qhov kub ntawm lub substrate yog siab dhau lawm vim hais tias ncaj qha bombardment ntawm lub substrate los ntawm ib tug loj tus naj npawb ntawm lwm yam electrons.

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